Fabrication and Properties of Erbium-Doped Gallo-Germanate Glass Thin Films via RF-Sputtering
DOI:
https://doi.org/10.4302/plp.v17i1.1310Abstract
This paper presents novel research on amorphous thin films doped with Er3+ ions deposited using the RF-sputtering method. The obtained layers' surface morphology, chemical composition, and optical properties were examined. Scanning electron microscopy analysis revealed a homogeneous layer structure with thicknesses ranging from 160185 nm. Energy-dispersive spectroscopy confirmed the presence of elements such as Ge, Ba, and Ga. Optical properties were measured using photoluminescence spectroscopy, showing emission in the range of 15201550 nm, indicating potential for the integrated optics emission sources.
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