Smooth Al nanolayers deposition on sapphire and quartz substrates

Authors

  • Piotr Wróbel Faculty of Physics, University of Warsaw, Pasteura 7, 02-093 Warszawa, Poland
  • Tomasz Stefaniuk Faculty of Physics, University of Warsaw, Pasteura 7, 02-093 Warszawa, Poland
  • Arkadiusz Sylwester Ciesielski Nanostructures Engineering, Faculty of Physics, University of Warsaw, Hoża 69, 00-681 Warszawa, Poland
  • Tomasz Szoplik Faculty of Physics, University of Warsaw, Pasteura 7, 02-093 Warszawa, Poland

DOI:

https://doi.org/10.4302/photon.%20lett.%20pl.v5i2.402

Abstract

We report on roughness of 70nm thick Al films deposited on fused silica and sapphire substrates using e-beam physical vapour deposition (PVD) system with exact control of substrates temperature. Before evaporation both types of epi-polished substrates are cleaned using low-energy Argon ion bombardment. The roughness of films deposited at 450, 297, 170 and 92K is measured with atomic force microscope (AFM). The lowest average root mean square (RMS) roughness equal 0.98 nm is obtained for 70nm Al film on sapphire deposited at 170K.

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References
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Author Biographies

Piotr Wróbel, Faculty of Physics, University of Warsaw, Pasteura 7, 02-093 Warszawa, Poland

dr Piotr Wróbel, adiunkt

Tomasz Stefaniuk, Faculty of Physics, University of Warsaw, Pasteura 7, 02-093 Warszawa, Poland

dr Tomasz Stefianiuk, adiunkt

Arkadiusz Sylwester Ciesielski, Nanostructures Engineering, Faculty of Physics, University of Warsaw, Hoża 69, 00-681 Warszawa, Poland

lic. Arkadiusz Ciesielski, student

Tomasz Szoplik, Faculty of Physics, University of Warsaw, Pasteura 7, 02-093 Warszawa, Poland

prof. dr hab. Tomasz Szoplik, profesor zwyczajny

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Published

2013-06-30

How to Cite

[1]
P. Wróbel, T. Stefaniuk, A. S. Ciesielski, and T. Szoplik, “Smooth Al nanolayers deposition on sapphire and quartz substrates”, Photonics Lett. Pol., vol. 5, no. 2, pp. pp. 42–44, Jun. 2013.

Issue

Vol. 5 No. 2 (2013)

Section

Articles

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