Extreme ultraviolet and soft X-ray imaging using compact laser-plasma sources based on a double stream gas-puff target

Authors

  • Przemysław Wojciech Wachulak Insitute of Optoelectronics, Military University of Technology
  • Andrzej Bartnik Insitute of Optoelectronics, Military University of Technology
  • Jerzy Kostecki Insitute of Optoelectronics, Military University of Technology
  • Łukasz Węgrzyński Insitute of Optoelectronics, Military University of Technology
  • Tomasz Fok Insitute of Optoelectronics, Military University of Technology
  • Roman Jarocki Insitute of Optoelectronics, Military University of Technology
  • Mirosław Szczurek Insitute of Optoelectronics, Military University of Technology
  • Henryk Fiedorowicz Insitute of Optoelectronics, Military University of Technology

DOI:

https://doi.org/10.4302/photon.%20lett.%20pl.v5i4.418

Abstract

New developments in science and technology require imaging tools and techniques capable of imaging with increased contrast and high spatial resolution, such as an extreme ultraviolet (EUV) and soft X-ray (SXR) microscopy. In this paper, we report on our recent activities related to various imaging techniques in the EUV and SXR region of electromagnetic spectrum, employing a double stream gas-puff target source. Those techniques has been successfully used for studies of morphology of thin silicon membranes coated with NaCl crystals, samples composed of ZnO nanofibers and biological samples.

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References
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Published

2013-12-31

How to Cite

[1]
P. W. Wachulak, “Extreme ultraviolet and soft X-ray imaging using compact laser-plasma sources based on a double stream gas-puff target”, Photonics Lett. Pol., vol. 5, no. 4, pp. pp. 146–148, Dec. 2013.

Issue

Vol. 5 No. 4 (2013)

Section

Articles

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