The Nd:YAG dual-channel laser system with Q - modulation for direct interference lithography

Authors

  • Jan Andrzej Marczak Institute of Optoelectronics, Military University of Technology
  • Antoni Rycyk Institute of Optoelectronics, Military University of Technology
  • Antoni Sarzyński Institute of Optoelectronics, Military University of Technology
  • Marek Strzelec Institute of Optoelectronics, Military University of Technology
  • Krzysztof Czyż Institute of Optoelectronics, Military University of Technology

DOI:

https://doi.org/10.4302/photon.%20lett.%20pl.v6i1.453

Abstract

A dual-channel laser system consisting of an Nd:YAG generator with Q - modulation and a "p – branch" type unstable resonator has been presented in the article. The laser assembly has been configured in such a way to constitute the arms of a Mach-Zehnder interferometer. The regulation of the amplification coefficient in both amplifying channels allows for quick and easy changes of the output energy in each channel up to the value of approximately 1.5 J, with the laser pulse duration of 8-10 ns. The Mach-Zehnder configuration of the interference assembly allowed for quick and easy changes of the angle between the interfering laser beams.

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References
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Published

2014-03-31

How to Cite

[1]
J. A. Marczak, A. Rycyk, A. Sarzyński, M. Strzelec, and K. Czyż, “The Nd:YAG dual-channel laser system with Q - modulation for direct interference lithography”, Photonics Lett. Pol., vol. 6, no. 1, pp. pp. 44–46, Mar. 2014.

Issue

Vol. 6 No. 1 (2014)

Section

Articles

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