Aberration generators in tandem

Authors

  • Jorge Ojeda Castaneda University of Guanajuato, Mexico
  • Ana L. Barragán-Chávez University of Guanajuato, Mexico
  • Cristina M. Gómez-Sarabia Digital Arts, Campus Salamanca, University of Guanajuato, Mexico

DOI:

https://doi.org/10.4302/photon.%20lett.%20pl.v7i1.546

Abstract

We discuss the use of a pair of phase masks, which have both radial and helical variations, for optically implementing wavefront aberration generator. We show that by using these masks one can change continuously the aberration coefficients of both symmetric and asymmetric aberrations. Some numerical simulations illustrate our proposed procedure.

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References
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Author Biography

Jorge Ojeda Castaneda, University of Guanajuato, Mexico

Electronics Department, Professor

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Published

2015-04-01

How to Cite

[1]
J. Ojeda Castaneda, A. L. Barragán-Chávez, and C. M. Gómez-Sarabia, “Aberration generators in tandem”, Photonics Lett. Pol., vol. 7, no. 1, pp. pp. 8–10, Apr. 2015.

Issue

Vol. 7 No. 1 (2015)

Section

Articles

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