MARCZAK, Jan Andrzej; RYCYK, Antoni; SARZYŃSKI, Antoni; STRZELEC, Marek; CZYŻ, Krzysztof. The Nd:YAG dual-channel laser system with Q - modulation for direct interference lithography. Photonics Letters of Poland, [S. l.], v. 6, n. 1, p. pp. 44–46, 2014. DOI: 10.4302/photon. lett. pl.v6i1.453. Disponível em: http://m.photonics.pl/PLP/index.php/letters/article/view/6-16. Acesso em: 20 nov. 2024.